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Dan Casmier Dan Casmier's CV

Ph.D., Chemistry, University of Washington, Seattle, WA; Thesis Title: Systematic Study of Thiazole Incorporated NLO Gradient Bridge Chromophores;
Advisor: Prof. Larry R. Dalton, GPA: 3.53

B.S., Chemistry (summa cum laude), Pacific Lutheran University, Tacoma, WA; ACS certification; Thesis Title: The Design and Performance of Cyclic Olefins in 193-nm Lithography; Advisor: Dr. Robert Allen, GPA: 3.90

2004-Present Senior Process Engineer, Intel Corporation, Hillsboro, OR.

  • Involved in install/qualification of several 193-nm exposure tools
  • Sustaining duties of 193-nm scanner/stepper manufacturing tools in latest chipset process

Research Interests: electro-optics, organic materials chemistry, lithography,
dendrimers, fuel cells, photorefractive materials, and conducting polymers

Special interests: running, hiking, camping, baseball, and racquetball, and homebrewing

PUBLICATIONS

Frequency-agile hyper-Rayleigh scattering studies of electro-optic chromophores. Firestone,< K. A.; Lao, D. B.; Casmier, D. M.; Clot, O.; Dalton, L. R.; Reid, P. J. Proc. SPIE-Int. Soc. Opt. Eng. 2005 (in press).

New paradigm in NLO chromophore design through a gradient bridge concept. Casmier, D.M.; Sullivan, P.A.; Clot, O.; Firestone, K.A.; Eichinger, B.E.; Lee, S.; Heller, S.; Brumbaugh, A.; Millard, B.; Dalton, L.R. Proc. SPIE-Int. Soc. Opt. Eng. (in press).

Organic electro-optics: exploiting the best of electronics and photonics. Dalton, L.R.; Robinson, B.H.; Nielsen, R.; Jen, A.K.; Casmier, D.; Rabiei, P.; Steier, W.H. Proc. SPIE-Int. Soc. Opt. Eng. 2003, 4991 (Organic Photonic Materials and Devices V), 508-519.

Approaches to etch-resistant 193-nm photoresists: performance and prospects. Allen, R.D.; Opitz, J.; Ito, H.; Wallow, T.I.; Casmier, D.M.; DiPietro, R.A.; Brock, P.J.; Breyta, G.; Sooriyakumaran, R.; Larson, C.E.; Hofer, D.C.; Varanasi, P.R.; Mewherter, A.M.; Jayaraman, S.; Vicari, R.; Rhodes, L.F.; Sun, S.; Proc. SPIE-Int. Soc. Opt. Eng. 1999, 3678 (Pt. 1, Advances in Resist Technology and Processing XVI), 66-77.

Cyclic olefin resist polymers and polymerizations for improved etch resistance. Allen, R.D.; Opitz,< J.; Ito, H.; Wallow, T.I.; Casmier, D.M.; Larson, C.E.; Sooriyakumaran, R.; Hofer, D. C.; Varanasi, P.R. J. Photopolym. Sci. Technol. 1999, 12(3), 501-508.

PATENTS

Hyperpolarizable organic chromophores. Dalton, L.R.; Jen, A.K.-Y.; Londergan, T.; Carlson, W.B.;
Phelan, G.; Huang, D.; Casmier, D.; Ewy, T.; Buker, N.; PCT Int. Appl. 2002, Pat#WO0208215, 104 pp.

PRESENTATIONS

New paradigm in NLO chromophore design through a gradient bridge concept. Casmier, D.M.; Sullivan, P.A.; Clot, O.; Firestone, K.A.; Eichinger, B.E.; Lee, S.; Heller, S.; Brumbaugh, A.; Millard, B.; Dalton, L.R.; Photonics West, San Jose, CA, January 24-29, 2004.

Nonlinear Optical Polymeric Materials; ACS Northwest Regional Meeting (NORM2002), Gonzana University, Spokane, WA, June 19-22, 2002.

Design, synthesis, and NLO properties of chromophores modified with fluorinated dendrimers. Casmier, D.M.; Chai, Z.; Londergan, T.; Zhang, C.; Dalton, L.; 219th ACS National Meeting, San Franciso, CA, March 26-30, 2000.

AWARDS

  • International Society for Optical Engineering (SPIE) Scholarship (April 2002)
  • Ramstad Scholarship from Pacific Lutheran University, Department of Chemistry (June 1998)
  • Organic Chemistry award from Division of Polymer Chemistry of the ACS (May 1997)

AFFILIATIONS

  • American Chemical Society (ACS) – 6 years
  • International Society of Optical Engineers (SPIE) – 2 years
  • Society on Information Display (SID) – 1 year

 

Athletic achievements:
1997, 1998 - NAIA Athletic All-American (Track) 5K Racewalk
1998 - NAIA National Championship in 5K Racewalk

 

 
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