i-AMT Shared Instrumentation Facilities (SIF):
The i-AMT is establishing a set of shared facilities which provide comprehensive suites of equipment for materials synthesis, device fabrication, and materials and device characterization. These facilities will significantly enhance the efficiency of material and device development. The instrumentation are available both to the UW research community and to local industry. The first examples of these shared facilities include the following:
SIF I. Inert Atmosphere Fabrication and Testing System for Organic Devices:
A tandem inert atmosphere glovebox equipped with a sophisticated evaporator system and state-of-the-art electronic testing equipment has been established through the Murdock Charitable Trust and the DOD DURIP program. This facility allows researchers at the University of Washington to make significant contributions to many areas of organic electronics, electro-optics and surface science. The ability to fabricate devices totally in inert atmosphere provides the advantage of producing repeatable results comparable to those of a much wider scientific community. This fabrication and testing facility is maintained by staff from the Nanotech User Facility who trains equipment use and provides maintenance. This lab is a cost-per-use basis to provide for long-term sustainability.
SIF II. Shared Optoelectronic Device Test Facility:
A world-class facility for optoelectronic device testing has recently been established. This facility supports efforts in integrated photonics and complement the existing world-class materials synthesis and characterization efforts on campus. This facility has two primary missions: First, to provide comprehensive test capabilities for nanoscale silicon and hybrid silicon/polymer photonic devices. Such devices provide a unique path for the revolutionary polymer photonic materials being developed at the UW to be turned into working devices. The second goal is to provide flexible testing capabilities for a wide variety of optoelectronic devices in other material systems and geometries, in order to lower the barriers to entry into optoelectronics projects across the entire campus. The facility will be accessible to users from off-campus, such as local companies, in order to spur academic/industrial collaborations as well as commercialization of university technologies. Equipment for testing ultrafast devices in both the time and spectral domains will be included in this facility, as well as the relevant mechanical equipment for wafer-scale optoelectronic probing. We anticipate that the facility will eventually house equipment such as optoelectronic, cryogenic, vacuum probe stations for controlled-environment device testing.
SIF III. Electron Beam Lithography Facilities:
Electron beam lithography is a fundamental technique for fabricating nanostructures on the 10 nm (~100 atom) scale, and is a key enabler for research in nearly all fields of nanoscience. This capability is essential for creating the next generations of nanoscale devices and systems; no other technology provides the same combination of high resolution, flexibility, and speed as EBL. In fact, a modern electron beam lithography tool is the most flexible, capable, cost-effective research tool for building nanostructures. Such a tool can be used both for single-layer and three dimensional device fabrication since it is capable of overlaying multiple layers with only a few nanometers of position error.
The researchers in i-AMT have obtained funding for purchasing a high throughput EBL tool to enable the integration of the UW's world-leading photonic materials capabilities with novel design of nanoscale devices, for next-generation information technology. The tools commonly available in the academic community are generally only 1/1,000th as fast as the tool that is being pursued, and are only capable of writing nanostructures over sub-millimeter areas. By contrast, the new tool will be capable of writing sub-20 nm structures across entire 6'' diameter wafers, enabling researchers to build integrated nanoscale systems, rather than individual devices. We anticipate that this tool will be used by researchers across the entire Pacific Northwest.
SIF IV. Facility for Synthetic Scale-up and Purification:
For many biological, optical, and electronic studies being carried out by the researchers in the Institute and the industrial partners, reasonably large quantities of materials with high purity are required. Most academic laboratories lack the necessary scale-up equipment. A multi-users facility (500 ft2) for synthetic scale-up and purification will be established at the Hall Building to provide synthetic capabilities for production of new materials in multi-gram or multi-liter amounts and purity compatible with device fabrication or coating purposes. Through well-coordinated and efficient operation of this facility, materials will be produced and supplied to a number of collaborators within the Institute, as well as government labs and industrial partners to facilitate technology transfer. This laboratory will be equipped with state-of-the-art equipment for synthesizing (e.g. single-mode focused microwave reactor and large reactors) and characterizing (e.g. HPLC, GPC) compounds made in this facility. Highly experienced professional staff will be hired to oversee the facility and works with various groups on developing synthetic procedures for production of materials on a large scale.
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Last modified: 10/17/2008 2:37 PM