Highly Integrated Experimental Facilities

Full facilities for synthesis of organic & polymeric functional materials

 

Synthetic Materials Characterization
GPC for molecular weight measurement, DSC and TGA for thermal analysis, BAS-CV 50W Voltammetric analyzer for electrochemcial stability and energy levels

Device Fabrication
Instruments: environmentally controlled glove box, spin coater, organic and metal evaporation chambers, sputter coater, oxygen plasma etcher, UV-curer, inert annealing chamber

Device Characterization for OLEDs, OPVs, OTFTs
Instruments: HP4155B Semiconductor Parameter Analyzer, HP4192A Impedance Analyzer, CCD Spectrometer, Photo Scanner

Laser Microfabrication
Instrument: Choherent Mira900 (ultrafast modelocked laser), 700-1000nm wavelength, 100-fs pulse width, 76MHz repitition rate
Current uses: nonlinear fluorescence excitation, cross-section determination, and microfabrication
Electro-Optic Materials Characterization
Instruments: corona and contact poling setup, simple reflectio technique to measure electro optic coefficient, optical waveguiding and modulating setup
Optical Properties Characterization
Instruments: Perkin Elmer Lambda 9 UV/vis/NIR Spectrophotometer, Metricon 2010 prism-coupler for refractive index & optical loss

Morphological Materials Characterization
Instruments: Digital Instruments MultiMode Nanoscope IIIa Scanning Probe Microscope capable of STM and contact or non-contact AFM in ambient, liquid or gas environments. Dektak 3030 Profilometer for measuring thin film thickness, optical microscopy, and access to the UW Electron Microscopy Center and Washington Technology Center