We are among the pioneers of nanoimprint lithography, a new area of research complementing our exsisting strengths in the areas of photo- and e-beam lithography to create novel magnetic elements. We use advanced techniquies to characterize our samples, including Transmission Electron Microscopy, Scanning Probe Microscropsy, Synchertron Spectromicroscopy,
Nanoimprint, photo- and e-beam lithography
Nanoimprint and photo lithography of magnetic elements (nanorings, nanowires and nanodots) and arrays not limited to epitaxial patterning, 3D patterning and lithographic nanoparticles. E-beam lithography of magnetic nanowire and nanoring devices. Extensive characterization using electrons (SEM, TEM, holography), photons (synchrotron radiation), magneto-optical methods (MOKE), magnetometers, and neutrons as well as scanning probes. Magnetic characterizations including both static (hysteresis, ZFC, FC) and dynamic (AC susceptibility, domain wall movement) measurements focusing on the magnetic coupling, interface, magnetic-logic and magnetoelectronic properties.
Transmission Electron Microscopy (TEM)
X-ray Magnetic Reflectometry
Nanofabrication and Characterization