Most investigations of TMD materials rely on samples obtained via mechanical exfoliation with scotch tape. While this method yields high quality monolayers, it is time consuming and usually limits the scope of feasible experiments to a single monolayer or bilayer. Physical vapor deposition (PVD) offers a scalable means for direct growth of TMD materials with controllable size and layer number. This bottom-up approach involves sublimating TMD precursor powders which then nucleate to form crystals on a wafer substrate. Several types of TMD monolayers (WSe2 and MoS2) have been grown using PVD, and show high optical quality similar to exfoliated monolayers. More complicated vertical and in-plane heterostructures of MoSe2 and WSe2 have also been grown reproducibly in high yield using PVD synthesis.