Rates

Effective Dates: July 1, 2011 to June 30, 2012
Please notice: charges associated with the use of NTUF tools and processes and staff assistance are different for internal (UW), external academic (including Federal and State institutions) and external non-academic or industrial users.  The rates for external non-academic users from federally funded or non-profit organizations are the same as for external academic users.  This category includes industrial users whose project at NTUF is funded by federal agencies, such as NSF, NIH, DOE etc. Please provide us with the information on your funding.

FEI Transmission Electron Microscope (TEM) Tecnai - F20, per hour

• Internal– $68
• External Academic - $78
• External Non-Academic –$280
• To encourage industry users to purchase TEM time slots in advance, we will provide quarterly fee at $5,600 /quarter for maximum 40 hours usage and at $11,200/quarter for maximum 80 hours usage.

FEI Scanning Electron Microscope (SEM) XL Siron / Bruker D8 Discover XRD system, Biacore SPR, per hour

• Internal $42
• External Academic $49
• External Non-Academic $170
•  To encourage industry users to purchase time slots in advance, we will provide quarterly fee at $3,400/quarter for maximum 40 hours usage and at $6,800/quarter for maximum 80 hours usage.

All other tools: Zeiss Confocal/Multimode AFM/ Dimension 3100 AFM/ Renishaw Raman Microscope/ Heidelberg direct writer/ Woollam Ellipsometer/Oxford OpAL ALD/ Microtome and Diamond Saw, per hour

• Internal $27
• External Academic $31
• External Non-Academic $85
• To encourage industry users to purchase tool time slots in advance, we will provide quarterly fee at $1700/quarter for maximum 40 hours usage and at $3400/quarter for maximum 80 hours usage.

Micro- and Nanofabrication lab access, per month

• Internal $120
• External Academic $139
• External Non-Academic $350

Staff assistance (including training and contract work), per hour

• Internal $70
• External Academic $81
• External Non-Academic $130

(To receive a quote on a particular contract work, please contact Alec Pakhomov at pakhomov@uw.edu)
Routine fabrication processes in the fab lab include:

• Rapid prototyping training to fabricate masters of patterned photoresists with feature sizes greater than 20 microns
• PDMS fabrication training that includes surface treatment of masters, PDMS casting, removal of PDMS from masters
• Microcontact Printing training that includes printing of self-assembly monolayer, proteins, and other materials
• Solvent Assisted Microcontact Molding (SAMIM) training that includes molding of micro- and nano-patterns in photoresist and e-beam resist
• Service on customer designed soft lithographic experiments

Additional hosted services include (please inquire on the rates):

• Thermal evaporation of gold on silicon, glass, or mica
• Thermal evaporation of silver on silicon, glass, or mica
• Oxygen plasma cleaner training
• Purchase of PDMS masters (master I and master II)
• Purchase of PDMS stamps (master I and master II)

Workshop tools include:

• SCS programmable spin coater
• Programmable hotplates
• Photolithography system with UV exposure and power regulation
• Contact mask aligner for photoresist exposure
• Programmable oven
• Surface treatment of master
• Oxygen plasma cleaner
• Thinky mixer
• PDMS casting
• DI water system