Photonics Research Center

**Instrument List / Reservation** (Reservation for Qualified Users ONLY; Please Abide by Rules):
Durip Evaporator
Durip Glovebox 1
FL 375 nm Laser
FL 405 nm Laser
FL 470 nm Laser
FL 640 nm Laser
FL 780 nm Laser
Fluorescence Lifetime System
Large Hotplate Durip Box 1
Murdock Evaporator
Nicolet 8700 FTIR
Quantum Yield LED System
Signatone Probe Station
Silanization Oven
Small Hotplate 1 Durip Box 2
Small Hotplate 2 Durip Box 2
Small Hotplate Murdock Box 2
Small Roaming Hotplate Murdock
Solar Simulator
Spin Coater Durip Box 2
Spin Coater Murdock Box 2
Sublimation Purification System

Location: Bagley 453

The Photonics Research Center is a multi-user shared research facility that houses state-of-the art equipment for the fabrication, materials characterization, and device testing associated with thin film optoelectronic devices. The primary goal of the center is to facilitate research and development of organic electronic and optoelectronic devices such as thin-film transistors, energy efficient light-emitting diodes, and solar cells. At the core of the facility are two inert atmosphere processing and thin-film deposition systems that allow for sample preparation and device testing without exposing samples to water and oxygen. This capability is essential to making high-performance, durable devices from organic semiconductors, but may be used by other users provided their processes are compatible with the processes of established users. An extensive array of equipment for the optical and electrical characterization of materials and thin film devices is also available for use in and out of the gloveboxes.

For training and facility related questions, please contact facility manager:
Dr. Michael Salvador
Department of Chemistry - Ginger group
Box 351700
Seattle, WA 98195
msalva@u.washington.edu
206 616-2988
Visit here for additional training information.

Selected Instruments and Description:

	Description
	Glovebox workstations (MBraun) and thin-film deposition systems (Angstrom Engineering): This system provides inert working conditions for thin-film device preparation and fabrication. It can attain purity levels of less than 1 ppm oxygen and moisture. The workstations integrate thin film deposition systems and components for semiconductor device fabrication applications, including spin coater (Laurell WS-400-6NPP), multi-source thermal deposition and e-beam evaporation (AMOD and EVOVAC from Angstrom Engineering).
	External Quantum Efficiency Measurement System – Integrating Sphere (Hamamatsu, C9920-12): This instrument measures absolute quantum yields of photo-luminescent materials. Both solid (films, powders) and liquid samples can be analyzed. A Xenon lamp coupled to a monochromator enables photo-excitation over a broad spectral range. This system uses a high-sensitivity photonic multi-channel analyzer (Hamamatsu C10027-01) to measure a light emission spectrum. The light flux is then calculated from the spectrum to measure the external quantum efficiency of light emitting materials.
	Fluorescence Lifetime Spectrometer (PicoQuant, FluoTime 100, PicoHarp 300): The FluoTime 100 spectrometer allows recording of fluorescence decays by means of Time-Correlated Single Photon Counting (TCSPC). Decay times of down to 40 picoseconds can be resolved. The time resolution of the time correlated single photon counting system (PicoHarp 300) is specified with 4 ps. The laser excitation wavelengths available are: 375, 405, 470, 640 and 750 nm. The laser pulse width is in the range of 70 – 90 ps. The system can be used with films on substrates or solutions. Cut-off filters are available for spectral filtering of the emission light.
	Solar Simulator and Photovoltaic characterization (Solar Light, 16S-300-002 Air Mass Solar Simulator): This is a turn key PV Cell testing solar simulator (300 W Xe lamp). The output of this simulator produces full spectrum sunlight (AM1.5) and is a class "A" spectrum solar simulator. The spot size is typically 2.25 inches with an 1 sun output intensity. The setup includes an I-V curve source meter (Keithley, 2400) and PV characterization software.
	Fourier Transform Infrared Spectrometer – (ThermoScientific, Nicolet-8700): FTIR spectrometer with a HgCdTe detector, step-scan capabilities, and a Harrick GATR grazing angle attenuated total reflectance (ATR) accessory. This spectrometer can be used in the ATR geometry to characterize solid, thin film, or liquid samples in the infrared spectral region.
	Wafer Inspection Microscope (Leica, Reichert Polylite 88): Brightfield microscope (upright, reflected light illumination) with variable magnification of up to 100x.
	Low pressure plasma system (Diener, Femto): This plasma system features a stainless steel plasma chamber with a plasma etching RF driven aluminum or steel electrode. The plasma power supply can be continuously adjusted from 0 – 100 W at 40 kHz. The system can be operated with different gases for cleaning, activation and etching of surfaces.
	Split-Hinge Tube Furnace (ThermoScientific, Lindberg/Blue M): This tube furnace features three independent heating zones, each ajustable up to 1200°C. It can be used with a variety of ceramic, quartz or alloy process tubes. Applications include material purification, annealing, crystal growing, calibration, heat treating.