Citation
Liu, L. H.; Zorn, G.; Castner, D. G.; Solanki, R.; Lerner, M. M.; & Yan, M. D. (2010). A simple and scalable route to wafer-size patterned graphene. Journal of Materials Chemistry, 20(24), 5041-5046.Abstract
Producing large-scale graphene films with controllable patterns is an essential component of graphene-based nanodevice fabrication. Current methods of graphene pattern preparation involve either high cost, low throughput patterning processes or sophisticated instruments, hindering their large-scale fabrication and practical applications. We report a simple, effective, and reproducible approach for patterning graphene films with controllable feature sizes and shapes. The patterns were generated using a versatile photocoupling chemistry. Features from micrometres to centimetres were fabricated using a conventional photolithography process. This method is simple, general, and applicable to a wide range of substrates including silicon wafers, glass slides, and metal films.Keyword(s)
arrayscovalent immobilizationfabricationgraphiteliquid-phase exfoliationlithographyoxidepolymer thin-filmssurfacesNotes
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Cited References Count:32