Control of surface film composition and orientation with downstream PECVD of hexafluoropropylene oxide

Citation

Butoi, C. I.; Mackie, N. M.; Barnd, J. L.; Fisher, E. R.; Gamble, L. J.; & Castner, D. G. (1999). Control of surface film composition and orientation with downstream PECVD of hexafluoropropylene oxide. Chemistry of Materials, 11(4), 862-+.

Abstract

Highly oriented fluorocarbon films are deposited downstream from an inductively coupled rf plasma using hexafluoropropylene oxide (HFPO). Angle-dependent XPS results [takeoff angles of 0 degrees (upper) and 80 degrees (lower)] demonstrate that the films comprise CF(2) chains terminated by CF(3) groups at the outer surface of the film. NEXAFS data establishes that the CF(2) groups are aligned in chains which are oriented normal to the substrate.

Keyword(s)

chemical-vapor-deposition
thin-films

Notes

188KN
Times Cited:25
Cited References Count:17

Reference Type

Journal Article

Secondary Title

Chemistry of Materials

Author(s)

Butoi, C. I.
Mackie, N. M.
Barnd, J. L.
Fisher, E. R.
Gamble, L. J.
Castner, D. G.

Year Published

1999

Date Published

922924800

Volume Number

11

Issue Number

4

Pages

862-+

DOI

Doi 10.1021/Cm981081p