Deep depth profiling using gas cluster secondary ion mass spectrometry: Micrometer topography development and effects on depth resolution

Citation

Shin Muramoto & Daniel J. Graham (2021). Deep depth profiling using gas cluster secondary ion mass spectrometry: Micrometer topography development and effects on depth resolution. Surface and Interface Analysis, 1-10.

Abstract

Secondary ion mass spectrometry using the argon cluster primary ion beam enables molecular compositional depth profiling of organic thin films with minimal loss of chemical information or changes in sputter rate. However, for depth profiles of thicker organic films (>10 μm of sputtered depth), we have observed the rapid formation of micron-scale topography in the shape of pillars that significantly affect both the linearity of the sputter yield and depth resolution. To minimize distortions in the 3D reconstruction of the sample due to this topography, a stepwise, staggered sample rotation was employed. By using polymer spheres embedded in an organic film, it was possible to measure the depth resolution at the film-sphere interface as a function of sputtered depth and observe when possible distortions in the 3D image occurred. In this way, it was possible to quantitatively measure the effect of micronscale topography and sample rotation on the quality of the depth profile.

Keyword(s)

argon cluster
depth profiling
gas cluster sources
roughness
thick films
tof-sims
topography

Reference Type

Journal Article

Secondary Title

Surface and Interface Analysis

Author(s)

Shin Muramoto
Daniel J. Graham

Year Published

2021

Pages

1-10

DOI

DOI: 10.1002/sia.6983