Facilities and Equipment
2000 sq. ft. of laboratory space
Probe station (Bausch &Lomb, MicroZoom II) including a light microscope withavideo system (Sony DXC 390): The Microanalytical probe system isused to applyelectrical contact to test smallgeometric patterns.
Fluorescent microscope (Olympus BX41) with a video system (Olympus DP30BW): Used to indentifyflourescently label cells.
Amplifier and filter (Stanford Research System SR560): The SR560 is a high-performance, low-noise preamplifier.
Pico-amperemeter and I-V meter (Keithley 6485, 6487): The Models 6485 and 6487 are high-resolution bus-programmable (RS-232 and IEEE-488) picoammeters
Capacitance meter (GLK 3000)
Data acquisition system (Data Translation)
Oscilloscope (Agilent DSO3102A)
DC power supply (Agilent 6614C) and functiongenerator (Agilent 3322A x 2, BK precision 4012A x 2)
Vacuum chamber (NAPCO, Vacuum oven model 5831): Provideuniformtemperatureregulated by thermostat with range of 10 to 200 C, Vacuum range 1 atm. to 10 microns absolute pressure.
Spin-coater (Laurell, WS-400B-6NPP/LITE): Capable of spinning up to 150mm wafers. 10,000 RPM.
Laminar flow (Terra universal, (Hood : WhiperFlow, 1686-54B), (Filter, Fan Unit : 6701-99A)
Optical microscope (MEIJI EMZ8TR x2) and a videosystem(Olympus OLY 220, Industrial Vision source, IVCCAM2).
PCR and documentation system (GeneAmp 9600 PCR system, VISI Blue Trans-illuminator): For DNA detection.
BioRad q-PCR compatible with 96 well plates (BioRad, CFX96 Real-time system): For real-time DNA detection.
Biosafety cabinet (BSL-2) (LABGARD, Class II, Type A2): Allows to workwithpathogenssuch as M. tuberculosis and E. Coli.
Tip enrichment system: To concentrate and capture ourtargetbiomoleculesespecially in large volume sample.
Softwares: COMSOL Multiphysics 4.2, Matlab R2010a, L-edit V11.12, etc. UV photometer (BioRad).



Other Resources
1. Microfabrication Laboratory
Sputter deposition system
Wire bonder
Anisotropic etch bath
Oxidation furnace
Reactive ion etcher
Low pressure chemical vapor deposition (LPCVD) furnaces
Plasma enhanced chemical vapor deposition (PECVD) furnaces
Deep RIE system
E-beam evaporators
Mask aligners
Critical point drier


2. Center for Nanotechnology
Atomic Force Microscope (Veeco Multimode AFM)
Sputter deposition system
Scanning Electron Microscope (FEI Sirion SEM)
Laser Scanning Confocal Microscope (Zeiss LSM510)
Light Microscope (Leica DMIRBE)
E-beam lithography capability including a spinner, heaters, a sputter, and a thermal evaporator


3. Clean Energy Institute Electrohydrodynamic jet printer
Drop on demand (DOD) printer
Silk screening facility
Roll-to-roll printer
Other characterization and evaluation equipment