Citation
Nixon, Paul G.; Winter, Rolf; Castner, David G.; Holcomb, N. Rob; Grainger, David W.; & Gard, Gary L. (2000).
Pentafluoro-λ6-sulfanyl-Terminated Chlorosilanes: New SF5-Containing Films and Polysiloxane Materials.
Chemistry of Materials, 12(10), 3108-3112.
Abstract
Two new SF5-terminated perfluoroalkylsilanesSF5(CF2CF2)nCH2CH2SiCl3 (n = 1 and 2)were synthesized by addition of trichlorosilane to the corresponding synthetic SF5-terminated perfluoroalkenes by hydrosilylation. Thin films of these SF5-silanes on clean silicon oxide substrates were characterized by ellipsometry, aqueous contact angle, and X-ray photoelectron spectroscopy (XPS) methods. The shorter SF5-silane film shows a hydrophobic interface with minimal angle dependence in depth-dependent XPS analysis, suggesting a poorly organized film. The longer SF5-silane exhibits a high aqueous static contact angle (106°) and angular-dependent XPS compositional variance consistent with improved film assembly (fewer defects and more vertical chain orientation). Bulk SF5-bearing materials were fabricated by silane hydrolysis, producing SF5-polymers and cross-linked networks bearing the unique SF5 perfluoroalkyl chemistry.
Reference Type
Journal Article
Secondary Title
Chemistry of Materials
Author(s)
Nixon, Paul G.Winter, RolfCastner, David G.Holcomb, N. RobGrainger, David W.Gard, Gary L.
Year Published
2000
Date Published
970358400
Volume Number
12
Issue Number
10
Pages
3108-3112
DOI
Pentafluoro-λ6-sulfanyl-Terminated Chlorosilanes10.1021/cm000339k
