Pentafluoro-lambda(6)-sulfanyl-terminated chlorosilanes: New SF5-containing films and polysiloxane materials

Citation

Nixon, P. G.; Winter, R.; Castner, D. G.; Holcomb, N. R.; Grainger, D. W.; & Gard, G. L. (2000). Pentafluoro-lambda(6)-sulfanyl-terminated chlorosilanes: New SF5-containing films and polysiloxane materials. Chemistry of Materials, 12(10), 3108-3112.

Abstract

Two new SF5-terminated perfluoroalkylsilanes-SF5(CF2CF2)(n)CH2CH2SiCl3 (n = 1 and 2)were synthesized by addition of trichlorosilane to the corresponding synthetic SF5-terminated perfluoroalkenes by hydrosilylation. Thin films of these SF5-silanes on clean silicon oxide substrates were characterized by ellipsometry, aqueous contact angle, and X-ray photoelectron spectroscopy (XPS) methods. The shorter SF5-silane film shows a hydrophobic interface with minimal angle dependence in depth-dependent XPS analysis, suggesting a poorly organized film. The longer SF5-silane exhibits a high aqueous static contact angle (106 degrees) and angular-dependent XPS compositional variance consistent with improved film assembly (fewer defects and more vertical chain orientation). Bulk SF5-bearing materials were fabricated by silane hydrolysis, producing SF5-polymers and cross-linked networks bearing the unique SF5 perfluoroalkyl chemistry.

Keyword(s)

fluorocarbon chain
modifiers
monolayer films
silicon
surface

Notes

366YT
Times Cited:15
Cited References Count:36

Reference Type

Journal Article

Secondary Title

Chemistry of Materials

Author(s)

Nixon, P. G.
Winter, R.
Castner, D. G.
Holcomb, N. R.
Grainger, D. W.
Gard, G. L.

Year Published

2000

Date Published

970358400

Volume Number

12

Issue Number

10

Pages

3108-3112

DOI

Doi 10.1021/Cm000339k