Citation
Wong, Eva M.; Markowitz, Michael A.; Qadri, Syed B.; Golledge, Stephen L.; Castner, David G.; & Gaber, Bruce P. (2002).
Preparation of Quaternary Ammonium Organosilane Functionalized Mesoporous Thin Films.
Langmuir, 18(4), 972-974.
Abstract
The preparation of surfactant-templated periodic mesoporous silica thin films functionalized with N-((trimethoxysilyl)propyl)-N,N,N-trimethylammonium chloride (TMAC) is described. The supramolecular self-assembly of the triblock copolymer, Pluronic 123, served as a template for the formation of these functionalized silane films. In the as-prepared and extracted conditions, the films exhibited the p6 mm type hexagonal mesostructure with a large unit cell (a = 8.5?9.6 nm). Contraction of the films during heat treatment (250 °C for 2 h) reduced the pore spacing perpendicular to the substrate yielding Fm3m pore ordering, confirmed by X-ray diffraction and transmission electron microscopy. Ellipsometry measurements revealed the films to have thickness of ?400 nm in the as-prepared condition and ?300 nm in the heat-treated condition, a total shrinkage of ?25% perpendicular to the substrate. X-ray photoelectron spectroscopy measurements showed the incorporation of the TMAC to be 76?90% of the amount initially added following surfactant extraction.
Reference Type
Journal Article
Secondary Title
Langmuir
Author(s)
Wong, Eva M.Markowitz, Michael A.Qadri, Syed B.Golledge, Stephen L.Castner, David G.Gaber, Bruce P.
Year Published
2002
Date Published
1012521600
Volume Number
18
Issue Number
4
Pages
972-974
DOI
10.1021/la015623k
