Citation
Stile, Ranee A.; Barber, Thomas A.; Castner, David G.; & Healy, Kevin E. (2002).
Sequential robust design methodology and X-ray photoelectron spectroscopy to analyze the grafting of hyaluronic acid to glass substrates.
Journal of biomedical materials research, 61(3), 391-398.
Abstract
Sequential Robust Design experiments and X-ray photoelectron spectroscopic (XPS) studies were performed to examine the immobilization of hyaluronic acid (HA) on glass substrates chemisorbed with N-(2-aminoethyl)-3-aminopropyl-trimethoxysilane (EDS). Numerous reaction conditions were investigated, including the concentrations of 1-ethyl-3-(3-dimethylaminopropyl) carbodiimide hydrochloride (EDC), N-hydroxysulfosuccinimide (Sulfo-NHS), and HA, and the reaction buffer type, concentration, and pH. The elemental surface compositions of carbon and silicon (C/Si ratio) were used to assess the extent of HA immobilization, leading to the identification of critical HA-binding reaction conditions and the determination of an optimum surface chemistry. The optimum chemistry consisted of 200 mM EDC, 50 mM Sulfo-NHS, 10 mM N-(2-hydroxyethyl)piperazine-N'-(2-ethanesulfonic acid) (HEPES) buffer at a pH of 7.0, and 3 mg/mL HA. This work emphasizes the advantages of using Robust Design methods over traditional statistical experimental design, particularly when large numbers of variables are examined and costly analytical techniques are employed.
Keyword(s)
AdhesivenessBiocompatible MaterialsglassHyaluronic AcidMaterials TestingProsthesis DesignSilicone ElastomersSpectrum analysisSurface PropertiesX-Rays
Reference Type
Journal Article
Secondary Title
Journal of biomedical materials research
Author(s)
Stile, Ranee A.Barber, Thomas A.Castner, David G.Healy, Kevin E.
Year Published
2002
Date Published
1031184000
Volume Number
61
Issue Number
3
Pages
391-398
DOI
10.1002/jbm.10154
